产品图片：

产品型号：

NA-8000

产品特点介绍：

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• 1. All in One system
  - All units sucha as M/W plasma and power supply, Controll unit, and pumping units are included in system

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• 2. Applicable for 4” – 6” SiC wafer
  - Batch process using 330mm SiC tray

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• 3. Good process optimization for both CC and PR
  - M/W with high temperature stage and O2/N2 gas used

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• 4. Possible to use other applications
  - Organic film etching, Residue removal, Polyimide etching, etc