认 证:工商信息已核实
访问量:875480
1. Characteristics
ZEP520A is high performance positive EB resists which show high resolution, high sensitivity and dry etch resistance.
They are suitable for various EB processes.
(1) Resolution
Shows high resolution and rectangle pattern profile.
(2) Resistance to dry etching
Shows high dry etch resistance and they are almost equivalent to that of positive photoresists generally used.
(3) Sensitivity
Shows high sensitivity.
2. Properties
7. Spin Curve
8.Dependence on Prebake Temperature
9.Dependence on Development Temperature
9.Dependence on Development Time
10. Examples of application
11. Dry Etching Resistance
12. Example of Process Conditions
13.Handling Precaution
(1) Flammable Liquid.
(2) Harmful by inhalation.
(3) Avoid contact with skin and eyes.
CAUTION: Open carefully. Use in well ventilated area. In case of contact with skin and eyes, rinse immediately with plenty of water for 15 minutes and get medical attention. In case of fire use Alcohol form CO2 or dry chemical, never use water.
STORAGE: Keep capped and away from oxidants, sparks and open flame. Store at cool[32?F(0?C)~77?F(25?C)] and dark place. Use in clean room.
14. Appendix
- 推荐产品
- 供应产品
- 产品分类
- 德Optosol-K3太阳能吸收率发射率检测仪
- 半导体测试探针台KUP007,EMP100C,EMP100B,EMP50S
- N-TEC全自动晶圆清洗机BW 232FA
- N-TEC全自动晶圆贴片机BW 228-5FA
- N-TEC全自动晶圆贴片压合机228-3FA
- 英国Denton高真空蒸发器平台DV-502B
- 日本JEOL截面样品制备装置IB-19520CCP
- 德国laVision BioTec光片照明显微镜Ultramicroscop
- 英国HHV真空镀膜系统Auto500 GB
- 芬兰PICOSUN原子层沉积机P-300S Pro ALD
- PICOSUN P-200S Pro ALD生产型原子层沉积机
- 德国LaVision BioTec双光子显微镜TriM Scope
- P-1000 Pro ALD芬兰PICOSUN生产型原子层沉积机
- 德国Sentech等离子体增强原子层沉积机PE-ALD
- 日本JEOL核磁共振谱仪JNM-ECZR系列
- N-TEC半自动LED晶圆贴片机BW 262A



